半导体行业深度：MEMS传感器关注射频、惯性和压力三大应用领域-240401（28页）.pdf

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3、bcstu:4 FBAR abcEr1abc/067v.#wxyz67.123 Yole 453|#BAW abc(BAW-SMR O FBAR)9 2021:4 23.13+8=2026:4 36.44+#BAW489 2021:4 35%#;?(m1UV MEMS crl4m m1 w6(4#wx MEMS UVc14m#mU4m#mUVcVc!ctct#!$#!$44%&%&#()()*+,-,-.Q Q!cc/01/01?23234UVn1 w4UVn1 w(4545#667878OO9:9:4;#4;#;“!$!$6767O67O67?ccAAmmMEMSUVc1UVc1 l kkB

4、B!4!4CC(DEDEffFFggGHGHMEMSzz99II J6J6GGNNccKK(II .L6 G.L6 GNMNcNMNcKKM.NOIM.NOI EEffFFggDDPQRgPQST Silex)U4H MEMS z9C(#2012:=V#ST Silex MEMS z9WXHYZ#?(STMicroelectronics)TELEDYNE DALSA_F(TSMC)a(SONY)bcde1PQ MEMS xfTable_CompanyRptType1 !#$!#$!#$%&()*+,-.*2/29/01234 gFg4XhYij9(x4MNcOk4fl m4fn/op4IJ,s

5、tk4Xkg1 PQqtr(#DNA/RNA s”tukvvuwxvuyzOmvust9(OfgZ(4UC(1 J6J6DDPQr(E|Nctcyzhi1|Ncx4Mr#PQx|NHNR4B#F4!#;“954#mr|1 PQ4OxV4;#PQPQ;“9595 9595 9595 67 67?ee9595kkB95B95;6#6#PQHz4;c#c#PQ4c;#PQO B.4cwx;-#-#PQxmetC(4hi1PQ4kleA4C!h1 .L6D.L6Dr(ENXh MEMS MNc1PQrlxEN MEMS MNc#MEMS”O MEMS PQRS1PQ MEMS”?#nx#5RO41 m

6、hiB 8_(*+$)1PQPQ8844?MNc4#8HMNc4#8Hmm M.NO M.NO11 l RRee e!MEMS|cJ6GK(I.L6GKM.NOI#stEfFgGMEMS Hz9WXGHI l jj;|;|t#deP#t Table_CompanyRptType1 !#$!#$!#$%&()*+,-.*3/29 /01234!#$!#$1 MEMS-./01-./01.6 1.1 234234MEMS.6 1.2 56789:;56789:;?ABCD?ABCD%qYyy7NmHmz%qYyy7NmHmz.21 3.3 6%ef6%ef.25%.27 Table_Company