1、PROCEEDINGS OF SPIESPIEDigitalLibrary.org/conference-proceedings-of-spieNanoimprint lithography:today andtomorrowHirotoshi Torii,Mitsuru Hiura,Yukio Takabayashi,AtsushiKimura,Yoshio Suzaki,et al.Hirotoshi Torii,Mitsuru Hiura,Yukio Takabayashi,Atsushi Kimura,YoshioSuzaki,Toshiki Ito,Kiyohito Yamamoto

2、,Byung Jin Choi,Teresa Estrada,Nanoimprint lithography:today and tomorrow,Proc.SPIE 12054,NovelPatterning Technologies 2022,1205403(25 May 2022);doi:10.1117/12.2615740Event:SPIE Advanced Lithography+Patterning,2022,San Jose,California,United StatesDownloaded From:https:/www.spiedigitallibrary.org/co

3、nference-proceedings-of-spie on 11 Oct 2022 Terms of Use:https:/www.spiedigitallibrary.org/terms-of-useNanoimprint Lithography:Today and Tomorrow Hirotoshi Torii1,Mitsuru Hiura1,Yukio Takabayashi1,Atsushi Kimura1,Yoshio Suzaki1,Toshiki Ito1,Kiyohito Yamamoto1,Jin Choi2,Teresa Estrada2 1Canon Inc.,20

4、-2,Kiyohara-Kogyodanchi,Utsunomiya-shi,Tochigi 321-3292 Japan 2Canon Nanotechnologies,Inc.,1807 West Braker Lane,Austin,TX,78641 USA Abstract Imprint lithography is an effective and well-known technique for replication of nano-scale features.Nanoimprint lithography(NIL)manufacturing equipment utiliz

5、es a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate.The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action.Following th

6、is filling step,the resist is crosslinked under UV radiation,and then the mask is removed,leaving a patterned resist on the substrate.The technology faithfully reproduces patterns with a higher resolution and greater uniformity compared to those produced by photolithography equipment.Additionally,as